Alumina can exist in a number of metastable polymorphs in addition to the thermodynamically stable alfa.
It is often reported that al2 o3 PVD coatings are amorphous at low deposition temperatures [7-11], whereas substrate temperatures above 400-500 lead to the formation of gamma [7,11]. Alfa al2o3 was obtained by an RF sputtering technigue at substrate temperatures above 1100 [7] and with pulsed magnetron sputtering at significantly lower temperatures [12]. Because of technical differences between the applied sputtering systems and non trasferable process conditions, it is difficult to compare the individual results given in the literature with each other. For this reason an attempt was made in this paper to establish a correlation between deposition technique, deposition temperature and oxygen partial pressure on the hand and observed deposition rate and mechanical properties of the alumina films on the other, by using one single sputtering device and comparable conditions for the experiments.
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